| 摘要 |
<p>PURPOSE:To apply additional correction to the mask pattern, by applying a separating film such as vinyl acetate instead of a resist film, providing a window at the additional patterning position, thereafter applying a Cr film, separating the film, and removing the unnecessary Cr film. CONSTITUTION:The mask pattern of Cr2 is provided on a glass plate 1. First of all, the vinyl acetate series separating film 11 is applied to the thickness of about 100mum. Nd-Ar laser is irradiated to the additional patterning position, and the window is selectively provided only in the film. Then the Cr film 5 with the thickness of about 800Angstrom is evaporated, and the film 11 is separated. Thus the device is completed. In this constitution, a dissolving process of using alkali solution is not required in removing the Cr film, and the pattern can be simply corrected.</p> |
