发明名称 PHOTOMASK
摘要 PURPOSE:To obtain the photomask without using exposure technology by depositing a light transmitted ferromagnetic film, wherein magnetizing regions are formed, on a glass substrate, and absorbing and fixing a light transmitting ferromagnetic powder body layer on the magnetized regions. CONSTITUTION:Needle shaped FexOy crystals, wherein a binder is mixed at a desired ratio and their lengths are 1mum or less, are flatly applied to the thickness of about 5mum and solidified at about 130 deg.C. Then the magnetism orientation is performed and the transparent ferromagnetic film 2 is obtained. Thereafter the glass substrate 1 on which the FexOy film 2 is provided is placed on a precision XY table 5. A magnetic head 6 is approached, and magnetic pulses are sent to form magnetized regions 3 with the table 5 being moved based on the digital data of a reticle pattern. The Fe powder 8 coated by the binder is placed in a container 7 to the thickness of about 0.5mum. The film 2 of the substrate 1 is approached, the Fe powder 8 is deposited on the magnetized regions 3, the substrate 1 is heated at about 130 deg.C, the binder is melted and solidified, a light screening pattern 4 is formed, and the reticle is completed.
申请公布号 JPS57207334(A) 申请公布日期 1982.12.20
申请号 JP19810091785 申请日期 1981.06.15
申请人 FUJITSU KK 发明人 MIYAHARA ATSUSHI
分类号 H01L21/027 主分类号 H01L21/027
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