| 摘要 |
PURPOSE:To make it possible to measure the amount of plating and the composition of plating highly accurately by correcting the shifted amount of a wavelength due to Compton scattering obtained by the incident angle and the received angle of monochromatic X rays. CONSTITUTION:At first, monochromatic X rays are projected on a scattering plate by using the same optical system as in the measurement of a plated steel plate. The wavelength of the monochromatic X rays is measured from a theoretical expression by using the wavelength of Compton scattering lines. An optical system is adjusted so as to obtain an intended wavelength. Then, the theoretical computing expression for fluoresence X-ray intensity or the intensity ratio of the element for intended analysis obtained by using said optical system is determined beforehand. Then, a standard sample is used, and a converting coefficient for converting the actually measured values into the theoretically computed value is obtained beforehand. The fluorescence X-ray intensity or the intensity ratio obtained from the plated steel plate whose plated amount and composition of the plated film are unknown is measured. The values are converted into the theoretical intensity or the intensity ratio by using the converting coefficient. The plated amount and the composition of the plated film of the plated steel plate to be measured are determined from the plated amount and the composition of the film which are the parameters in the theoretical computing expression that are most close to the converted theoretical intensity or intensity ratio. |
