发明名称 MANUFACTURE OF SEMICONDUCTOR DEVICE
摘要 PURPOSE:To enhance manufacturing efficiency and to improve economy by concurrently performing the processes for decreasing the resistance values of two wirings of a power source line, a signal lines, and the like. CONSTITUTION:A first window part 14 is formed in an insulating layer 12 which is formed on a substrate 11. A second window part 24 is also provided in a resist 41. Then a conducting material 14 is coated over the substrate 11. The conducting material constitutes a conducting layer 21 in the window part 14. Then the conducting material is also embedded in the second window part 42, and it is made to be the wiring 13. Then the resist 41 is removed and the conducting material 43 is removed at the same time. Thereafter, a conducting layer is formed by using a specified mask, and the wiring 13' and wirings 13 and 31 are completed.
申请公布号 JPS57206049(A) 申请公布日期 1982.12.17
申请号 JP19810089461 申请日期 1981.06.12
申请人 FUJITSU KK 发明人 TAKEMAE YOSHIHIRO
分类号 H01L21/3205;H01L23/52;(IPC1-7):01L21/88 主分类号 H01L21/3205
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