| 摘要 |
PURPOSE:To obtain a glass photomask almost free from pinholes and having enhanced pattern accuracy by forming an oxide film on glass having an SiO2 film, further forming an electroless plated metallic film, and carrying out patterning. CONSTITUTION:A film of SiO2, Ta2O5 or a mixture thereof is laid on each glass substrate, and on the film an oxide film of >=1 kind of oxide selected from SnO2, In2O3, Sb3O5, TiO2, Ta2O5, Nb2O5, SiO2, GeO2 and ZrO2 is formed. On the oxide film a metallic film is formed by electroless plating. This metallic film is patterned in the desired shape by a prescribed method. At this time, by forming the oxide film by the hydrolysis of metallic alkoxide, the adhesive strength of the plated film is enhanced. By this method a large number of glass photomasks free from >=10mum pinholes and having high pattern accuracy are obtd. inexpensively. |
