| 摘要 |
PURPOSE:To reduce the error between the command value and the actual value as well as to improve the accuracy of exposure of an electronic beam by a method wherein the measurements at the time of maximum section and the current value thereon, and the current value at the time of minimum section of an electron beam is measured in advance, and a deflecting device is controlled based on these measured values. CONSTITUTION:A scanning by the electron beam which is adjusted to the prescribed measurements is performed by employing the electronic beam section varying device 3 consisted of the deflectors dx and dy, which is functioned by the measurement command sent from CPU4, masks m1 and m2 and the like. In such a case as above, the beam is scanned by a scanning deflector 11 by giving a maximum measurement command in the state of condition wherein a Faraday cup 15 is excluded, its measurements are measured by a detector 9, the difference between the command value and the measured value is detected and the difference is adjusted by giving the signal in proportion to the error to a level regulators 18x and 18y. Also the values obtained at the time of maximum section and minimum section are measured in the state of condition wherein the Faraday cup is arranged, the values are memorized at the CPU4 and the deflection device 3 is controlled based on these results of measurements. As a result, the accuracy of the electron beam exposure can be improved. |
