| 摘要 |
PURPOSE:To obtain a film forming device which is capable of forming uniform thickness of a film in both the circumferential direction and the axial direction of a film supporting body, and is capable of obtaining a film having high accuracy, by installing a leading-in port and an exhaust port of material gas so that they cross the axial core of a rotatable cylindrical film supporting body, and are shifted from each other in the axial drection of the film supporting body. CONSTITUTION:The inside of a reaction vessel 11 is pressure-reduced by a pressure- reducing device 30 by closing valves 24, 28, and opening a valve 31. Subsequently, a film supporting body 14 is reaised to a desired temperature by suppling electricity to a heater 17, the valve 31 is closed, the valves 24, 28 are opened, and material gas consisting of SiH4 and B2H6 diluted with H2 is led in 22.... Subsequently, in this state, high frequency electric power is supplied from a high frequency electric power supply 20, and glow discharge is executed. After that, the electric power supply 20 is turned off, the valves 24, 28 are closed, and the valve 31 is opened again, pressure is reduced, and cooling is executed to a normal temperaure, by which it is possible to obtain a film being an alpha-Si film and having desired uniform thickness of metallic luster, on the film supporting body 14. |
