发明名称 COMPOSITION AND PROCESS FOR CHEMICALLY STRIPPING METALLIC DEPOSITS
摘要 <p>An improved process and composition for chemically stripping metallic deposits from a substrate, and particularly, from the contact tips of electroplating racks and like apparatus to maintain proper operating efficiency thereof. The improved composition and method employs an aqueous acidic solution containing nitric acid, chloride ions and manganous ions present in an amount sufficient to accelerate the initiation of and the rate of stripping of the metallic deposits. The method and composition are applicable for chemically stripping a variety of metallic deposits at stripping rates substantially higher than those heretofore attainable with prior art compositions and techniques.</p>
申请公布号 CA1137396(A) 申请公布日期 1982.12.14
申请号 CA19800356214 申请日期 1980.07.15
申请人 OXY METAL INDUSTRIES CORPORATION 发明人 TOMASZEWSKI, LILLIE C.
分类号 C23F1/44;(IPC1-7):C09K13/04;C23F1/00;23F1/00 主分类号 C23F1/44
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