| 摘要 |
PURPOSE:To give an allowance to a processing accuracy of a depth of gap and to remarkably improve the yield of processes, by arranging a plurality of thin film magnetic elements on a base through the shift of the elements from the processing surface of the tip of the elements toward the orthogonal direction to the surface by a length twice the processing accuracy. CONSTITUTION:Two thin film magnetic elements 31 and 32 are located on a base 1 through a shift for 2DELTAl's share, as to processing base points (mark point specifying the depth of gap) X01 and X02 respectively, where is the processing accuracy (+ or -1-2mu). Since either one of the two elements 31 and 32 can be used for a magnetic converting element, when the processing end position due to the processing G such as lapping is from L2+DELTAL to L2-DELTAL to the point X01 of the element 31, the element 32 is used and when from L1+DELTAL to L1-DELTAL, the element 31 is used. Thus, the apparent optimum processing end point is L', the processing accuracy is L'+ or -2DELTAL, and since the processing accuracy is given a double margin, the yield can be improved. Thus, when n sets of elements are located, nDELTAL of processing accuracy can be given to the optimum processing end point. |
