| 摘要 |
The invention relates to the solution of the problems which can occur when the process of the principal patent P 2949383 is carried out, namely if colloidal silica is deposited from the polishing bath. This problem is solved according to the invention by subjecting the polishing acid to electrolysis in a two-chamber cell whose electrode chambers are separated by a semipermeable membrane or a porous wall. The electrolysis causes the colloidal silica to migrate out of the polishing acid, so that the latter can be fed back to its application.
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