发明名称 FORMING METHOD FOR MASK MATCHING MARKER
摘要 PURPOSE:To improve the positioning accuracy of a mask matching marker by exposing and forming a marker made of metal on a substrate. CONSTITUTION:A frame 6 is attached to the periphery of a cross marker pattern instead of a conventional cross marker pattern, the outer periphery 7 in the frame is constructed to be covered with an insulating layer 4, and a metal pattern of the marker 3 made of aluminum and copper alloy is exposed. In this case, the bonded part 5 of the cross marker to an SiO2 film 2 and the bonded part of the film 2 at the inside part of the marker frame 6 are undercut, but since the periphery 7 is secured by the layer 4, the displacement of position and the deformation can be suppressed.
申请公布号 JPS57201024(A) 申请公布日期 1982.12.09
申请号 JP19810086525 申请日期 1981.06.05
申请人 FUJITSU KK 发明人 WATANABE HIROMICHI
分类号 H01L21/027;G03F9/00;(IPC1-7):01L21/30 主分类号 H01L21/027
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