发明名称 POSITIVE TYPE PHOTORESIST COMPOSITION
摘要 PURPOSE:To improve the sensitivity of a 1,2-quinone diazide type photoresist compsn. by contg. water soluble polyhydric alcohol. CONSTITUTION:The compsn. prepd. by dissolving (A) 100pts.wt. alkali soluble polymer (e.g.; a copolymer of alpha,beta-ethylenic unsaturated carboxylic acid and a monoolefin type unsaturated compd.) and (B) about 5-100pts.wt. 1,2-quinone diazide compd. (e.g.; 1,2-benzoquinone diazide sulfonate ester) in an org. solvent (e.g.; methyl Cellosolve acetate) is added with (C) about 0.1-15pts.wt. water soluble polyhydric alcohol (e.g.; ethylene glycol, neopentyl glycol) basing on 100pts.wt. solids in the compsn., whereby the positive type photoresist compsn. is obtained.
申请公布号 JPS57201229(A) 申请公布日期 1982.12.09
申请号 JP19810086413 申请日期 1981.06.05
申请人 NIPPON GOSEI GOMU KK 发明人 HOSAKA YUKIHIRO;KAMOSHITA YOUICHI;HARITA YOSHIYUKI;HARADA TOKOU
分类号 G03C1/72;G03F7/022 主分类号 G03C1/72
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