| 摘要 |
<p>A multi-channel electron beam array lithography apparatus comprises parallel operated electron beam channels each of which is of the fly's eye type having an electron gun (13,14A, 14B, 15A, 158) for producing an electron beam, an array lenslet assembly (23), a respective fine deflector assembly (24) and a coarse deflector (11) for selectively directing the electron beam to a desired array lenslet within the array lenslet assembly and its respective fine deflector which thereafter directs the electron beam to a desired point on a target surface. A common movable stage (25) supports the target surface below the electron beam channels and moves the target surface relative to all the electron beam channels. An evacuated housing (12) encloses all of the electron beam channels.</p> |
