| 摘要 |
<p>An ion implanter according to the present invention comprises an ion source (1), a sample holder for supporting a sample (5) to be implanted with ions, and scanning means (6, 7) for scanning an ion beam (3) extracted from the ion source. Moreover, the sample (5) is located in a position where it can avoid neutral particles propagating rectilinearly from the ion source. An example of the scanning means is constructed of an air-core coil (6) disposed between the ion source (1) and the sample (5), and an A.C. power supply (7) for providing air-core coil with alternating current.</p> |
