发明名称 METHOD AND APPARATUS FOR DRY ETCHING
摘要 PURPOSE:To reduce the etching period and to prevent a sample from being made dirty, by arranging an intermediate electrode having a two-split structure in a bell-jar, etching the sample using a cathode and an anode, and carrying out secondary etching on the sample with the intermediate electrode interposed between the cathode and the anode. CONSTITUTION:The bell-jar is composed of the anode 3 and a vacuum bell-jar outer wall 1', and the intermediate electrode 7' with a two-split structure is supported through insulators 11 by movable operation rods 12 and is positioned in the bell-jar. The sample 4 is placed on the cathode 2, and the first etching is carried out by the anode 3 and the cathode 2. Then the intermediate electrode 7' is placed between the cathode 2 and the anode 3 by the movable operation rod 12, and the second etching is carried out to remove the damaged layer. Accordingly, the intermediate electrode 7' can be readily attached, and therefore the installing time can be reduced.
申请公布号 JPS57200571(A) 申请公布日期 1982.12.08
申请号 JP19810084002 申请日期 1981.06.01
申请人 FUJITSU KK 发明人 YOUDA SEIICHI;YAMAMOTO SUMIO
分类号 C23F4/00;H01J37/32 主分类号 C23F4/00
代理机构 代理人
主权项
地址