| 摘要 |
<p>Reactive Ion Etching (RIE) apparatus which provides for uniform etching of substrates (9) regardless of their position on a cathode (4) utilizes a perforated anode (10). These perforations (11) are interlaced, intersected or partially blocked with various configurations of conductive elements (12). Concentric circle, starburst, spiral arm and spiral configurations may be interlaced with the perforations in the anode to obtain uniform etching of substrates regardless of their radial position on the cathode. With all these configurations, the common factor is that the interlaced configurations intersect more perforations near the center of the anode or catcher plate than are intersected at greater radial distances.</p> |
