| 摘要 |
PURPOSE:To enhance the humidity resistance and the impression resistance, by applying a coating material, where microcrystalline silicon powder is dispersed in a binder, on a conductive supporting material and providing a surface coating layer on this coating material. CONSTITUTION:SiH4 and H2 generated from a silane bomb 1 are mixed uniformly and are led to a vacuous reaction vessel 1. They are decomposed by the heating (at 360 deg.C) due to a high-frequency glow discharge to obtain microcrystalline silicon powder containing 15-30atom% hydrogen. 5-60wt% this powder photoreceptor is dispersed in a binder (fluororesin) and is stuck onto an Al conductive substrate by the electrostatic coating and is sintered. Next, a silicon nitride film is formed as a surface protection film on this photoconductive layer by the chemical vapor-deposition method (CVD). An electrophotographic photoreceptor formed on the Al substrate in this manner has the impression resistance and has the reliability improved. |
