| 摘要 |
PURPOSE:To dry the surface of a wafer without polluting the same by using air purified through a filter for drying. CONSTITUTION:A rotary member 5 for retaining a wafer holding member 4 is provided inside a vessel consisting of an outer frame 2 and an upper cover 3. Moreover, a filter housing 7 has numerous purified-air discharging ports 8, and air entering from an air supplying port 11 is heated by a heater 10 and supplied to a wafer 15 from the discharging ports through a filter 9 for filtration. At the same time, an exhaust of air is conducted from air inlets 12 and thereby the inside of the vessel is maintained at negative pressure. A liquid removed from the surface of the wafer by centrifugal dehydration is exhausted from a drain 14 through a waterproof cover 13. |
