| 摘要 |
PURPOSE:To enable to take an accurate positional measurement of the material to be exposed as well as to contrive shortening of the total time required for exposure by a method wherein a position measuring device is arranged against the material to be exposed on the reverse side of the electron beam irradiation in the direction of optical axis. CONSTITUTION:The electron beam irradiated from an electron gun 5 passes through a focusing lens 6, a projection lens 7 and a deflector 9, and irradiated on the material to be exposed 8 such as a dry plate and the like on a stage 11 which is movable in horizontal direction. A position measuring probe 12 is arranged on an optical axis 4. The probe 12 consists of the glass fibers for light projection and light receiving, the reflection of the light emitted by a light source 15 is measured by a light detector 16, the results of which are processed by a central processing device 10, the position of the material to be exposed 8 is found out, and the projection lens 7 and the deflector 9 are adjusted. Accordingly, as an accurate measurement can be performed on the exposable part, whereon the material to be exposed 8 and the optical axis will be intersected, without shifting the stage, and the exposing work can be performed while positional adjustment is being performed, thereby enabling to shorten the time required for exposure. |
