| 摘要 |
PURPOSE:To quickly perform the detection of a mask-matching mark by a method wherein marks to be used for detection of the mask-matching mark are provided on the grid line of the photomask substrate. CONSTITUTION:The grid line 2 is arranged on a photomask 1, and the mask- matching mark 4 is formed in a chip region 3. Then, the mask-matching mark detection marks 5 and 6 are formed on the grid line in the direction of X and Y axis from the mask-matching mark. In order to detect the mask-matching mark quickly, the visual field 7 of an alignment scope is shifted on the grid line, the mask-matching mark detection mark is caught in the visual field, and then the visual field is shifted in the direction orthogonally intersecting with the detection mark. |
