发明名称 |
Dibasic ester stripping composition |
摘要 |
A mixture of a dibasic ester (DBE), an alcohol, and water to remove photoresist from a silicon wafer substrate. Photoresist is effectively removed at ambient temperature with this non-phenolic, non-halogenated stripper solution. Dissolved photoresist is easily separated from the water mixture for disposal.
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申请公布号 |
US5909744(A) |
申请公布日期 |
1999.06.08 |
申请号 |
US19980063627 |
申请日期 |
1998.04.20 |
申请人 |
SILICON VALLEY CHEMLABS, INC. |
发明人 |
SAHBARI, JAVAD J. |
分类号 |
C11D7/26;C11D7/50;G03F7/42;(IPC1-7):B08B7/00;B08B3/04 |
主分类号 |
C11D7/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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