| 摘要 |
PURPOSE:To equalize a volatile temperature on a mask substrate, and to make the thickness of a resist film uniform by moving a mask chucking section in the central direction of a shaft through the revolution of the mask chucking device and pushing the mask substrate. CONSTITUTION:Weights 7 connected to mask chucking sections 4 by wires 5 are mounted to each side of a mask substrate 3 while being opposed to the maks chucking sections 4, which can be moved in the central direction of the rotary axis of the substrate 3 and are contacted with one sides of the substrate 3. When spin revolution is started, the chucking sections 4 are moved in the central direction of a fixed axis by the wires 5 connected to the weights 7 having centrifugal force through revolution, and the substrate 3 is pushed against the central direction of the axis from four directions. The center of the substrate 3 is aligned at the center of the axis because the weight of the weights 7 is equal. |
