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发明名称
METHOD OF REMOVING THE LAYER OF THE LIGHT SENSITIVE MASK FROM THE SURFACE OF OXIDIZED SILICON COMPOUNDS
摘要
申请公布号
CS216551(B1)
申请公布日期
1982.11.26
申请号
CS19800008980
申请日期
1980.12.18
申请人
MICHALA,FRANTISEK,CS
发明人
MICHALA,FRANTISEK,CS
分类号
H01L21/00;(IPC1-7):H01L21/00
主分类号
H01L21/00
代理机构
代理人
主权项
地址
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