Lithographic masking medium and process for its production

摘要

A negatively functioning masking medium and a medium for production of microlithographic recordings contains a vinyl polymer which has pendant groups containing aromatic quaternised nitrogen. If the masking medium is exposed to the action of electron beams, ultraviolet light or X-rays, it undergoes a conversion from a state of high solubility to a state of low solubility in polar solvents, e.g. water or alcohols of low molecular weight. A process for pattern formation on substrates using the masking medium is furthermore disclosed. <IMAGE>