发明名称 |
Apparatus for the galvanic deposition of aluminum |
摘要 |
A system for the galvanic deposition of aluminum from aprotic organo-aluminum electrolytes free from oxygen and water wherein it is not necessary to remove a galvanizing drum from its associated galvanizing tank in order to load and unload work pieces being galvanized from the drum.
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申请公布号 |
US4360409(A) |
申请公布日期 |
1982.11.23 |
申请号 |
US19810269490 |
申请日期 |
1981.06.02 |
申请人 |
SIEMENS AKTIENGESELLSCHAFT |
发明人 |
STOEGER, KLAUS;BIRKLE, SIEGFRIED;GEHRING, JOHANN |
分类号 |
C25C3/08;C25D3/44;C25D17/20;(IPC1-7):C25D5/00;C25D17/18 |
主分类号 |
C25C3/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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