| 摘要 |
A cleaning and lubricating system is provided. The system includes an applicator comprised of a substrate carrying an excess of cleaning and lubricating compositions, and a buffing member, preferably in combination with the applicator. In operation, the applicator is wiped against a to-be-cleaned and lubricated surface of an article. This action coats the article with an excess thickness of lubricating composition. The coating is then wiped with the buffing member and the excess lubricating composition is transferred to the buffing member so that the coating on the article is now of a controlled thickness. When an excess supply of lubricating composition builds up on the buffing member portion of the system, the buffing member may then be used as a cleaning and lubricating applicator.
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