CONTINUOUS VACUUM DEPOSITION DEVICE

摘要

PURPOSE:To reduce a vapor deposition time and electric power by disposing a preheating chamber, a vapor deposition chamber and a cooling chamber which are separated by gate values in vertical directions and making the transfer of substrates by gravity possible. CONSTITUTION:A gate valve 2 between a preheating chamber 2 and a vapor depositing chamber 8 is opened to allow the heated substrates in the chamber 5 to fall into a net gate 10 in the chamber 8. Upon completion of the vapor deposition of the substrates, a gate valve 3 between the chamber 5 and the chamber 13 is opened to allow the substrates completed of the vapor deposition to fall into a cooling chamber 13 where the substrates are cooled. The vapor deposition time and electric power are reduced by the above-mentioned device.