发明名称 Automatic polishing machine for semiconductor wafers - has stack of cassettes carrying wafers with pistons to push cassettes into and out of polishing position
摘要 <p>The automatic polishing machine includes a loading and unloading mechanism for cassettes which carry the thin plates. A support carries a stack of cassettes and may be moved vertically on a post. A cassette support includes two slide rails lying parallel in a horizontal direction to receive one cassette from the stack. Two pistons are provided on either side of the stack - one to push the cassette from the stack, into the polishing position, and one to return it to the stack. An arm which may be moved both vertically and horizontally is attached to a supporting mechanism. On the free end of the arm there is a cassette support and a polishing head (7). In use this is situated adjacent to the stack to receive a cassette of plates for polishing.</p>
申请公布号 FR2505712(A1) 申请公布日期 1982.11.19
申请号 FR19810010183 申请日期 1981.05.18
申请人 PROCEDES EQUIP SCIENCES IND SA 发明人 LUCIEN GRISEL ET GABRIEL BOULADON
分类号 B24B37/34;B24B41/00;(IPC1-7):24B41/00;28D5/00;24B7/22 主分类号 B24B37/34
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