| 摘要 |
PURPOSE:To detect a positioning mark easily by providing a photomask substrate, which has a positioning mark, with a mask-matching-mark detection mark. CONSTITUTION:A photomask substrate has grid lines 2 made of opaque materials arrayed in a grating shape on its transparent substrate surface and marks 4 for mask matching made of opaque materials encircled with the grid lines and arranged on the transparent substrate surface. Then, marks 5 and 6 for mask matching mark detection are provided adjacently to or in contact with the X- axial and Y-axial grid lines 2 on the basis of the mask matching mark 4. As a result, the mask matching mark detection mark 4 is detected along the grid line 2 to detect a mask matching mark easily and rapidly along the X or Y axis. |
