发明名称 METHOD OF PRODUCING SEMICONDUCTOR LAYER SOLARG BATTERY
摘要 In this method, in which the semiconductor material is applied by means of plasma-spraying to a substrate, the energy density in the plasma zone is selected at such a high level that the semiconductor material vaporises. The semiconductor material is taken as a vapour jet out of the plasma zone and precipitated in the form of a semiconductor layer on a substrate. <IMAGE>
申请公布号 JPS57183075(A) 申请公布日期 1982.11.11
申请号 JP19820064108 申请日期 1982.04.19
申请人 LICENTIA PATENT VERWALTUNGS GMBH 发明人 RAINHARUTO DAARUBERUKU
分类号 H01L31/04;C23C4/10;C23C14/32;C23C16/513;H01L21/205;H01L31/052;H01L31/054;H01L31/062;H01L31/18 主分类号 H01L31/04
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