| 发明名称 |
ELECTRODEPOSITION PROCESS FOR FORMING AMORPHOUS SILICON |
| 摘要 |
<p>(U.S. 951,580) A method for electroplating amorphous silicon from a non-aqueous solution containing a silicon solute wherein a heat treatment is requisite to producing stable coatings of photoconductive amorphous silicon.</p> |
| 申请公布号 |
CA1135162(A) |
申请公布日期 |
1982.11.09 |
| 申请号 |
CA19790336434 |
申请日期 |
1979.09.26 |
| 申请人 |
EXXON RESEARCH AND ENGINEERING COMPANY |
发明人 |
BUCKER, EDWARD R.;AMICK, JAMES A. |
| 分类号 |
C25D13/02;C25D5/50;C25D9/08;H01G9/00;H01G9/20;H01L31/04;H01L31/20;(IPC1-7):30B29/06;25D11/32;C25D11/32 |
主分类号 |
C25D13/02 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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