发明名称 VACUUM DEPOSITION DEVICE
摘要 PURPOSE:To make the vapor deposition of high incident angles possible without damaging a belt-like body by providing a displacement roller which can change position between a supply roller and a back roller, thereby making the incident angle for vapor deposition of the belt-like body controllable. CONSTITUTION:In a cylindrical vacuum deposition tank 21 connected to a vacuum system (not shown) via a projection 22, a belt-like body 24 such as plastic film travels between a supply roller 23 and a take-up roller 25. A displacement roller 29 which can change position and a back roller 26 which cools the body 24 are provided between these rollers. The evaporating material 33 from a crucible 32 is limited of the vapor deposition angle by a mask 31, and the greater part thereof is vapor-deposited on the body 24 at high incident angles and part thereof at low incident angles in the part of the roller 26. Coercive force and angular ratios are controlled by changing the incident angles by the position of the roller 29. The body 24 is cooled by a cooler 30 and the roller 26, by which its damaging is prevented.
申请公布号 JPS57181373(A) 申请公布日期 1982.11.08
申请号 JP19810063386 申请日期 1981.04.28
申请人 HITACHI CONDENSER KK 发明人 MATSUZAKI SOUICHI;OSADA MINORU
分类号 C23C14/20;C23C14/24;C23C14/56;G11B5/85 主分类号 C23C14/20
代理机构 代理人
主权项
地址