发明名称 MOS INTEGRATED CIRCUIT DEVICE
摘要 PURPOSE:To prevent the Al electrode from melting by a method wherein the PSG excluding the gate electrode is coated with Si3N4 to restrain the PSG from chemically reacting to the externally permeated water. CONSTITUTION:The Si substrate 1 wherein the source 2, the drain 3 and the channel stopper 4 are formed is provided with the SiO2 field insulating film 5, the gate insulating film 6 and covered with the PSG 7. Next, the overall surface is covered with Si3N4 while the gate oxide film 6 and the joint pad 11 are selectively removed. Then the overall surface is further covered with the Al film and provided with the Al electrodes 8-10, the pad 11 and the like and covered with the protective insulating film 12. In this constitution, the Al electrode is prevented from corrosion reducing the troubles remarkably.
申请公布号 JPS57180171(A) 申请公布日期 1982.11.06
申请号 JP19810065467 申请日期 1981.04.30
申请人 NIPPON DENKI KK 发明人 KIMURA KIMIYOSHI
分类号 H01L21/768;H01L23/522;H01L29/78 主分类号 H01L21/768
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