Illumination device for a microlithographic projection apparatus having an element made of uniaxial crystal and having a plurality of refractive or diffractive structures extending along an axis being parallel or perpendicular to the crystal axis

摘要

The invention relates to an illumination device for a microlithographic projection exposure apparatus, comprising one first element, e.g. a lenticular lens array, a DOE or a CGH (100,200,300a,400,500a,900) having a plurality of diffractively or refractively beam-deflecting structures (120,220,320) extending in a common first preferred direction (D1), the light-conductance-increasing element having an optically uniaxial crystal material oriented in such a way that the axis (oa,oa-1) of said crystal material is either parallel or perpendicular to the first preferred direction (D1).