发明名称 HOLDING JIG, SEMICONDUCTOR WAFER GRINDING METHOD, SEMICONDUCTOR WAFER PROTECTING STRUCTURE, SEMICONDUCTOR WAFER GRINDING METHOD USING SUCH SEMICONDUCTOR WAFER PROTECTING STRUCTURE, AND SEMICONDUCTOR CHIP MANUFACTURING METHOD
摘要 <p>Provided are a holding jig which can eliminate troubles due to use of a protection sheet, a semiconductor wafer grinding method, a semiconductor wafer protecting structure, a semiconductor wafer grinding method using such semiconductor wafer protecting structure, and semiconductor chip manufacturing method. A holding jig (20) for holding a semiconductor wafer (W) is composed of a recessed hole (22) formed on the surface of a substrate (21); a plurality of supporting protrusions (23) arranged to protrude from the bottom surface of the recessed hole (22); a deformable adhesive film (24), which covers the recessed hole (22) by being supported by the supporting protrusions (23) and adhesively and removably holds the semiconductor wafer (W); and an exhaust path (25) for leading the air inside the recessed hole (22) covered with the adhesive film (24) to the external.</p>
申请公布号 WO2007105611(A1) 申请公布日期 2007.09.20
申请号 WO2007JP54628 申请日期 2007.03.09
申请人 SHIN-ETSU POLYMER CO., LTD.;LINTEC CORPORATION;TANAKA, KIYOFUMI;ODASHIMA, SATOSHI;HOSONO, NORIYOSHI;FUJIMOTO, YASUSHI;SEGAWA, TAKESHI 发明人 TANAKA, KIYOFUMI;ODASHIMA, SATOSHI;HOSONO, NORIYOSHI;FUJIMOTO, YASUSHI;SEGAWA, TAKESHI
分类号 H01L21/683;B24B37/04;B24B41/06;H01L21/304 主分类号 H01L21/683
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