| 摘要 |
PURPOSE:To improve washing effect by giving ultra-sonic oscillation to washing liquid while the washing liquid is supplied to an object by jet-supply. CONSTITUTION:An ultrasonic oscillator 3 is provided to the upper part of a receiver 8. Pure water 5 is supplied to the bottom surface of a wafer 6 through a flow paths 9 which penetrate through the oscillator 3. The wafer 6 is fixed by suction under a supporting mechanism 10 which can be rotated. To wash the wafer, the pure water 5 is made flow over the upper surface of the oscillator 3 and the bottom surface of the wafer 6 is immersed in the pure water 5. Then ultra-sonic oscillation is generated by the oscillator 3 and the supporting mechanism is rotated. |
