| 摘要 |
PURPOSE:To make suited to superposition of multilayers by providing a gradient at the edge of an electrode by a method of forming a conductor pattern using a lift-off method. CONSTITUTION:A positive type photoresist layer 22 is formed on a substrate 21, a metal layer 23 is formed on the layer 22, and is then patterned in the prescribed shape. When the layer 22 is exposed with the layer 23 as a mask, a light is diffracted directly under the mask hole through the hole and the layer 22 is thus exposed in the region larger than the mask hole, is then developed to dissolve and remove the photosensed part of the layer 22, and the end of the hole of the layer 23 is extended in an overhang shape. A conductive material is adhered in this state, a conductive layer 24a is formed on the mask, a conductor layer 24b having a gradient at the edge is formed on a substrate 21, the mask 23 and the layer 24a are removed together with the photoresist 22, thereby obtaining the conductor of the prescribed shape. |
