发明名称 REDUCED PRESSURE CVD DEVICE
摘要 PURPOSE:To prevent broken pieces of a product dropping from a tubular wall from being adhered to a wafer by disposing a detachable barrier between a reaction tube and the wafer and energizing and heating the barrier. CONSTITUTION:A barrier 7 made of silicon carbide is provided between the tubular wall of a reaction tube 1 and a wafer 3, the barrier 7 is detachably supported on supports 8 provided at both end sides of a wafer holder 2, and energizing electrodes 10 are provided through leads 9 at both ends of the barrier 7. In this manner, the product dropping from the tubular wall is heated and adhered to the barrier 7. Accordingly, the product is not adhered to the wafer. Since the barrier is detachable, the barrier can be exchanged at every treatment and can be cleaned.
申请公布号 JPS57176718(A) 申请公布日期 1982.10.30
申请号 JP19810062903 申请日期 1981.04.23
申请人 MITSUBISHI DENKI KK 发明人 KOTANI KIYOUHIKO;MASUKO YOUJI;TAKANO HIROZOU;HOSHIKA HARUYUKI
分类号 C23C16/44;H01L21/205;H01L21/31 主分类号 C23C16/44
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