| 摘要 |
FIELD: optics. ^ SUBSTANCE: invention refers to measurement of light scattering characteristics of optoelectronic instruments (OEI) and can be used in techniques of experimental measuring of a reflection indicatrix, direction finding characteristic and effective scattering area of OEI under laboratory conditions. The device contains a source of emission (a laser), a forming system, two beam splitters, an inspected and standard retro-reflectors, a receiving collimator, two transparent mat screens, two projecting systems, two matrices of a CCD (charge coupled device), connected to a microprocessor, and a monitor. The standard retro-reflector is assembled near an entrance pupil of the inspected retro-reflector in the emission beam. The first mat transparent screen, the first projecting system and the first matrix of the CCD are arranged in series on the way of emission of the beam going out of the receiving collimator. The second mat transparent screen, the second projecting system and the second matrix of the CCD are arranged in series on the way of emission of the beam reflected from a flat parallel plate. ^ EFFECT: invention upgrades accuracy of OEI light scattering characteristics measurement due to reduction of systematic errors caused by dependence of a current value of standard reflectors EPR (electron paramagnetic resonance) on a distance of their location. ^ 13 dwg |
