发明名称 APPARATUSES AND METHODS FOR RESISTIVELY HEATING A THERMAL PROCESSING SYSTEM
摘要 A resistive heater having a doped ceramic heating element embedded either partially or completely within a matrix of undoped ceramic material. The ceramic may be silicon carbide, and the dopant may be nitrogen. Many of the advantages of the present heater stern from the fact that the materials used for the heating elements and the matrix material surrounding those elements have substantially the same coefficient of thermal expansion. In one embodiment, the heater is a monolithic plate that is compact, strong, robust, and low in thermal mass, allowing it to respond quickly to power input variations. The resistive heater may be used in many of the reactors and processing chambers used to fabricate integrated circuits, such as those that deposit epitaxial films, and carry out rapid thermal processing.
申请公布号 KR100847367(B1) 申请公布日期 2008.07.21
申请号 KR20037006714 申请日期 2003.05.16
申请人 发明人
分类号 H01L21/00 主分类号 H01L21/00
代理机构 代理人
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