METHOD AND APPARATUS FOR DRY ETCHING OF SILICON NITRIDE FILM,申请号JP19860211691-传众专利搜索

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发明名称	METHOD AND APPARATUS FOR DRY ETCHING OF SILICON NITRIDE FILM
摘要
申请公布号	JPS6399533(A)	申请公布日期	1988.04.30
申请号	JP19860211691	申请日期	1986.09.10
申请人	TOSHIBA CORP	发明人	HAYASAKA NOBUO;SUDOU SAYAKA;OKANO HARUO
分类号	H01L21/302;H01L21/3065	主分类号	H01L21/302
代理机构		代理人
主权项
地址

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