| 摘要 |
PURPOSE:To omit a process for removal of a photoresist mask and to form a color filter pattern, by imagewise exposing a specified photoresist film formed on a colored layer, and developing it with a developing solution containing an aliphatic hydrocarbon. CONSTITUTION:A far urltraviolet ray photoresist having >=300nm spectral sensitivity is used for forming a color filter pattern, and as a developing solution, a solvent containing an aliphatic hydrocarbon is used. As the resin of said photoresist to be used, a rubber type resin is desirable, neoprene and isoprene rubber, cyclic rubber, and natural rubber, etc. are embodied. As the photosensitive agent, p-phenylene-bisazide, 4,4'-diazidobenzophenone, etc. are embodied. As the solvent for the photoresist, aliphatic hydrocarbons represented by the formula CnH2n+x, (n=4, 5, 6..., X=-2, 0, 2) are desirable, and pentane, cyclopentane, octane, etc. are embodied. |
