| 摘要 |
PURPOSE:To uniformly apply a coating material within a short time, by a method wherein a substrate is arranged in the container rotated by a rotary shaft so as to be allowed to be spaced apart from the rotary shaft in an inclined state and integrally rotated along with the container after the supply of the coating material. CONSTITUTION:The resist solution injected from an injection port 14 connected to a resist pressurizing device enters a plenum chamber 15 and flows through the hollow part 16 provided to a shaft 3 and passes through a distribution pipe 17 to flow out along the end surface of a substrate 1 from a taper nozzle 18. Since the substrate 1 is supported by the shaft 3 by fixing metal fittings 21, 22 so as to be inclined at a position spaced apart from the shaft 3, the centrifugal force acting on the substrate 1 becomes smaller in difference and the coating of the resist solution can be performed within a short time and the thickness of a resist film becomes uniform. Further, the re-adhesion of the resist solution due to the rebounding of the solution scattered to the circumference of the substrate 1 is eliminated, and the excessive resist solution is discharged from the small holes provided to a rotary cylinder 2. |
