| 摘要 |
PURPOSE:To produce a boron vibration diaphragm, by forming a thin layer of a boride on a sintered zinc oxide substrate and forming a boron layer on the zinc oxide substrate by the chemical vapor-deposition method and removing by dissolving the zinc oxide. CONSTITUTION:Zinc oxide powder is formed into a disc of 20mm. diameter and 1.5mm. thickness under a pressure of 300kg/cm<2> by compression, and several discs produced in this manner are piled up and are put in an alumina board and are sintered in air at 1,100-1,400 deg.C for one hour. A sputtering device is used to stick films consisting of a titanium boride on the sintered zinc oxide substrate varying the film thickness to 0.01mum, 1mum, 2mum, and 4mum while heating it to 300-450 deg.C. These samples with film stuck are held at a temperature of 1,100 deg.C in a CVD reaction vessel with an infrared condensing lamp. Under this condition, a mixed gas of one volium part boron trichloride and three volium parts hydrogen is controlled by a rotary pump and the operation of valves so that the pressure in the reaction vessel is 10 Torr. Thus, an amorphous boron layer with a thickness of about 80mum is formed. This substrate is cut by a laser, then zinc oxide is removed, thus obtaining a boron substrate. |
