发明名称 MEMORY CELL WITH CONDUCTING LAYER-DIELECTRIC-CONDUCTING LAYER STRUCTURE
摘要 FIELD: physics. ^ SUBSTANCE: invention relates to micro- and nanoelectronics, and specifically to memory devices made using micro- and nano-electronic methods. The memory cell includes two electrodes with a dielectric layer placed between them. The dielectric layer has defects which provide electrical conduction by tunneling carriers in the defects, and contains semiconductor material impurities near one of the electrodes which provide for acquisition, storage and removal of electric charge, which blocks current from flowing in the defects of the dielectric layer. ^ EFFECT: design of a two-electrode nonvolatile reprogrammable memory cell with reproducible parametres, using the effect of electrical charge storage. ^ 6 dwg
申请公布号 RU2376677(C2) 申请公布日期 2009.12.20
申请号 RU20070128293 申请日期 2007.07.23
申请人 FIZIKO-TEKHNOLOGICHESKIJ INSTITUT ROSSIJSKOJ AKADEMII NAUK (STATUS GOSUDARSTVENNOGO UCHREZHDENIJA) 发明人 ORLIKOVSKIJ ALEKSANDR ALEKSANDROVICH;BERDNIKOV ARKADIJ EVGEN'EVICH;MIRONENKO ALEKSANDR ALEKSANDROVICH;POPOV ALEKSANDR AFANAS'EVICH;CHERNOMORDIK VLADIMIR DMITRIEVICH
分类号 B82B1/00;H01L27/105 主分类号 B82B1/00
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