| 摘要 |
PURPOSE:To bring difference with either one temperature distribution to predetermined value by measuring the difference of temperature distribution between the mask and the wafer and elevating the temperature of the other side. CONSTITUTION:The temperature distribution of the photo-mask 8 held onto a mask holder 10 is detected by means of a plurality of sensors 2 for measuring the temperature distribution, the detecting signals are transmitted to a main controlling command device 4, signals for making the temperature distribution of the surface of a wafer chuck 11 the same as the temperature distribution of the photo-mask 8 are transmitted to a plurality of controllers 5 by the device 4, the temperature of heaters 6 is controlled by the signals of the controllers 5, and the temperature distribution of the wafer chuck 11 is controlled. Accordingly, the temperature distribution is detected by means of a plurality of the sensors, the mean value of the data is calculated by means of the main controlling command device 4, and the wafer chuck is controlled, thus eliminating the difference of the temperature distribution with the photo-mask. |
