发明名称 METHOD FOR PROTECTING ION SOURCE APPARATUS
摘要 PURPOSE:To ease the temporary potential difference between components and protect the components by a method wherein a surge absorption element is attached across the components constituting a source plasma generating assembly. CONSTITUTION:A surge absorption element comprising high frequency capacitors 25-30 or non-linear resistors, or a combination of them is connected across each component of a source plasma generating assembly in an ion source apparatus 1 or in the neighborhood of the apparatus. Due to the connections, it is possible to solidify the potential against surge voltage for all components and to allow temporary voltage to be produced across the components, so that these components are protected.
申请公布号 JPS57168450(A) 申请公布日期 1982.10.16
申请号 JP19810053811 申请日期 1981.04.10
申请人 NIPPON GENSHIRYOKU KENKYUSHO 发明人 MATSUDA SHINZABUROU;MATSUOKA MAMORU
分类号 H01J27/00;H01J27/02;H05H1/22 主分类号 H01J27/00
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