| 摘要 |
Antireflection oxide coatings for solar cells are prepd. by using clear solns. prepd. by reacting M(OR)n (M is <=100% Ti, <=25% Si, and <=100% Ta; R=C1-6 alkyl; and n = valence of M) with a soln. of crit. amts of H2O and/or inorg. acid in alc. The n of the coating can be varied by several techniques, including altering the proportion of Ti and Si in the coating, the firing temp., and the firing atm. Coating thickness can be controlled by verying the rpm in spin application, withdrawal rate in dipping application, by concn, of the soln., by the type of solvent, or the degree of polymn. of the Ti oxide antireflection coatings was demonstrated.
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