| 摘要 |
PROBLEM TO BE SOLVED: To provide a liquid processing method, a liquid processing device, and a recording medium for liquid processing capable of enhancing the uniformity of coating state of process liquid for a substrate.SOLUTION: A coating unit U1 includes a rotation holding section 20 for rotating a wafer W, a nozzle 32 for supplying process liquid R onto a surface Wa of the wafer W, and a control section 60 for controlling the position of the nozzle 32 for the wafer W. A processing method includes a step for starting to supply process liquid R onto the surface Wa of the wafer W at a position eccentric from the center of rotation CL1 of the wafer W, while rotating the wafer W in a first rotation speed ω1, a step for shifting the supply position of process liquid R to the center of rotation CL1 side, and a step for spreading the process liquid R to the outer peripheral side of the wafer W, by rotating the wafer W in a second rotation speed ω2 greater than the first rotation speed ω1, after the supply position of process liquid R has reached the center of rotation CL1.SELECTED DRAWING: Figure 4 |
