| 摘要 |
<p>PURPOSE:To prevent the occurrence of the thermal distortion such as creases and curls without degrading the mechanical characteristic of a base film, by applying a constant tension to the base film to form a thin film and applying a constant tension to the base film to subject it to heat treatment. CONSTITUTION:After a constant tension is applied to a base film 10 to form a thin film on the surface, a constant tension is applied to the base film 10 to subject it to the heat treatment. For example, the base film 10 wound around a supply reel 18 is wound up around a reel 20 through a tension controller 22, a cooling can 26, etc. in a housing 16 of a take-up type vacuum vapor-depositing device. Vapor-deposition source materials 42 such as Co are vaporized by heating to be vapor-deposited, and the base film 10 where a thin film is formed is heated by heaters 36 and 38 to be subjected to the heat treatment.</p> |
